RVP-300/RVP-550
Production-proven 300mm furnaces were introduced in the world’s first 300mm fab in 1999. Since then, we’ve continuously refined these products, which led to developing the RVP Ace.
Vertical Batch Furnace
RVP-300/RVP-550
RVP-300plus and RVP-550 Rapid Vertical Processors for 200mm and 300mm wafers
Feature
Production-Proven Design with Superior Productivity and Control
Engineered for high-throughput 300mm processing with advanced temperature control.
Smart layout enables zero side spacing, maximizing fab space and efficiency.
Key Features for High-Volume 300mm Production
- The RVP-300 Plus/550 is the industry’s production-proven 300mm furnace
- Superior productivity
- Full complement of APCVD and LPCVD process selections
- Designed to occupy minimal fab space
- Layout provides for multiple systems with zero side spacing required due to innovative packaging
- Excellent accessibility for maintenance from rear
- Enhanced Temperature Control
- Utilizes fast ramping element and forced air cooling
- Proprietary Advanced Temperature Control software to maximize throughput by minimizing the time to attain and cool from process temperature
Capability
Versatile Process Capability for Oxidation, Deposition, and Annealing
Handles a full range of 300mm thermal processes, from LPCVD to ALD.
Supports high-temperature steps up to 1200°C with excellent control.
- Wet/dry thermal oxide
- Radical oxidation
- Silicon Nitride (Stoichiometric and low stress)
- TEOS, SiH₄ and DCS-based SiO₂
- Doped (P, As, B) and un-doped polysilicon
- Atomic Layer Deposition
- Anneal and Cure : 100 to >1200°C
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