Spica, Sirius, Sculptor
SPT’s Reactive Ion Etching (RIE) systems — Spica, Sirius, and Sculptor — are designed for precise, high-uniformity etching of hard-to-process materials such as SiC, GaN, compound semiconductors, and thermal oxide. With advanced plasma control and optimized chamber design, our tools deliver excellent anisotropy, selectivity, and process stability for both R&D and mass production environments.
Applications:
- Through-Silicon Via (TSV)
- Power Devices
- LED Devices
- Optical Devices
- RF Devices (Radio Frequency Devices)